励起ナノプロセッシングによる物質機能の開拓
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(6) 2.2 Ã[r²ÒÆ/´§àj ),4ZN. [(h 2 /2m) 2 + Veff (r)]i (r) = E i i (r). XDG>RZL. Veff (r) = V (r) + e 2 n( r) / r r dr3 + μxc (r). 2.2.1Õæ. Ôâßp. ¹À. ¶µ. 2.1 ÓÛ. ) êXÌ. ¯ )+SWNT. i . :M7BV p, / * ë. :M. μxc (r) =. E xc [n] n. (2.2.3) (2.2.4). 7BVp!ê~£µ !§à j- ). Êêâ. , Í*-,ë. ¥ * O@X9QVV â * ãâO@X9Q Vêb·ßO@X9QV μxc x,ëâ. Õæ!êX̯ )³. ,¦Üp/Í,& ê SWNT ½. §à. /j, êÔâßê#+i ,ÌÅ . m!]. ,¢n[âO@X9QV!êr. Ñ. ) p Ù
(7) , /êÃ[r²ÒÆ ),. â°Ñ¤ )+Ö", /¶µ ëlfµ !êSWNT. iwt:M7BV/ª&, ê. ±Ø §à³ . ß.+. ¢®/ * ,. /¶µ ,ë. n(r) = i (r). Ã[r²ÒÆ !êçAZ=(ÉçJTPZ=/ ×ÒÆ/,¬. k2FV6ZêâÄ. ². Ë»,ëÃ[r²ÒÆ !ê. «ß²×(HZBUZYK3?7Úe ê Î Úe¬ |, ê£Õæ!«ß¬ ~ â°ÒÆ/Ïë Ã[r² *. 2. (2.2.5). i. c]. ) êâyæ!ìâ9RWA1. X5Z¼/;VK8X9:@XB Ñ yæ . h. ~°. q¢° *(2.2.5)_*-,ë. ¸,ë *êc]. 2.2.2ÒƬ. s IXCÒƬ!êc^. «ß¬ )+âÇ. «ß . ·ßO@X9QV. ²×. ©º . * . ,ëêá !êâ. ÁÞµp ¿(. , dÒÆ,ë. d ê. Úe(LDA),ë Úe!êÁÞµ p,â /ê u f¾/' n(r) â5: ,ë Í,ëå} dr ,b·ß2F. ). yæ/ìây. âé ' âÇ ~° k2FV6Z E TOT !êâm/ n(r) , ê n(r) «ß [µ _*-ên(r) ©âm
(8) ¡ ,ë E TOT [n] !¨Ð
(9) ,ë E TOT [n] =. V (r)n(r)dr. 3. + T[n] + e 2 /2 . n(r)n(r) / r r dr dr 3. 3. + E xc [n]. { 2.2.1 SE?B;V. (2.2.1) Ã`ä! n(r) /_,) ìâÚe. âÇ. Ýo2FV6ZêÃ\ä!â·ag´êÃzä! k. âÞf·ag´/v%b·ß2FV6. Zä,ëâm . yæ!êâ. b·ß2FV6Z(b. æ ¸,
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(11) ,ë ¢n—âO@X9QV/ Veff ,ë { 2.2.2 LUV0X<ZX. 30. (2.2.2).
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(23) è« - «+ ą ZX!ĀÔ²"Ą¶ù!f *, SWNT !û ´ò n- 0«Ç Ë-ą! "Ą ¶ùf*$. \´ò×x0hÁ- *, SWNT !û Äê0i - 0Ëy -ą. 2.3 B E U L 3 7 S k ! ' ! © ä J P < L 4 ?>T8JS=; 2.3.1 éþ! + îĄeÒ 0ÁL37SL:T »Å.Ą eH13F)üý!ÕØ_¯¨ -Ók £à â .-ą[10, 11] ¿Ą!* ¯¨ "Ąt35T4?>T8 â Þ F32;0 - }ú,Ą.0â āñs GVM4?>T8(Fast atomic beam etching: FABE))35TGVM4?>T8(Ion beam etching: IBE) Á+.-ą Ą.+!¢º -4?>T8RV@"Ą§p nm/min Í t 35T4?>T8 ·í- ü ó
(24) Ą!¦ z ¹'+.-ą Ą/./."Ąü±¯¨!©ä!āñÓ kJS=;!ÉÑ0ŵ Ą!'!L37S L:CT8!©Ê£à!ÉÑ0' ą āñÓk "Ąû GVMlëJP<L (Electron Beam Excited Plasma: EBEP) ÆÅĄ.0 ÁeH13F !üý¯¨ -āñ ª4?>T80¿- 0Ü-ąû G VMlëJP<L"kñ.û GVM0Á ĄeH13F !üý¯¨ (¬ ÞF32;0 - Ą&Ąā JP<L0ÃÀ- uÝ- d. Ýj0¤,Ąpoly-Si ) GaAs -4?>T 8JS=; "ÈÏ ß/.w.-ą [12, 13]. ~ 2.3.1 āñs ÖGVM4?>T8áÚ *,Ą 92 10 m !92ôg RT<0k` Ă°o Û³Wr¸Ą^¸¥aă. 34.
(25) o 2.3.2 Ì¿ju«ÍFAB) *-3@?V9³ X ` sk Ï DC e EBEP mË /
(26) Ï. ¤¦ÃFS;t¸q EBEP /»- FS;t¸q EBEP /¾# -Ð 2.3.2 EBEP /Ì¿¨fx L28UL:V c É{ 3 af x'+.,Ïo 2.3.1 ¥* ÏbI0 2EW §Ê TV</\ -fx´.-Ð !Ï bI02EWKUWJ Ïn¹ *b|-'Ïh±- mË. -ÏTV</¶- Ïb/ª,¼& - NR@A-Ð 3@?V9 Ï$$ -Ï ¨iÀ& BQ23@?V9Z -Ð KQ<L/_3@?V9 Ïr dÈ E21;/ -* +.-Ð . Ï{²{ KQ<L3@?OW Ï{Êr Y +]l E21;/ 24V/} ¼& -Ð$ÏX¯ KQ<L 3@?V 9³ ÏÉ{ E21;/ - É z Ç'Ï * · w ÏÏ 24VGWM3@?V9)ÏÌ¿ju«GWMÍFABÎ +.-Ð o 2.3.2 ÏFAB *-3@?V9³ X`/¥ ÐKQ<L/1DWB 5>WB Ä^ Ï ./Ìp DC È/ 24V/f¿Ï7O HQRWKTWACPWAQ2<r " -[©% ( -Ð * 3@?V 9/²!Ïr E21;/ -´ Ï3@?TWAÉz ] mË-У °* 20Ñ30nm TWA+. 'Ï bI02E fx/²Å ÏÉz Ä-Ð ./¢¬iÏvKU=; ½ -'Ϥ ¦ ÏÈuGWMgºKQ<LÍEBEPÎ gºG WM *-®yE21;~ ¡Ð ³ Ï6;-Ác ÈuGWM/f¿ ¼& 6;µÆ-еÆ24V). o 2.3.3 ¤¦ÃFS;t¸ EBEP 3@?V9³. 35.
(27) ė ݵ.ģQY?S ¨µ.- ģ . g/. ċx ė!ģÇ £ėġù¡ L31> ¨µ.Ģģ £ė *35^<_ > -Ĥ 35^<_> *-Ç" q 35^4J[8_0 ·Ĉ&ėN_U 4J[8_v® - Ù¯ ,ģ.0Þ -¿Ñ0öÊĤ aĉ* ģċ (ģEBEP ( -ÿõ Ēá.,ģÙ L31> ė0$ ,°Ā <Z;^ !ģ࿲4ED^: µz- -ĤģSiO2 ģ Íćâğ{Ċė °Ā ( ČÞh ! Ĥ Ãåé! EBEP 0Þ SiO2 4ED^:Q]@> ÷² åé Ĥ ðÈģSiO2 4E D^:\_H! 117nm/min ÆÑ-ğĊN _U4ED^:Q]@> Íć- 10 mda { Ċ¦ Ü ģ࿲ 4ED^: (µz Ĥ[14, 15] +ģDirect Current (DC)v ®.ėN_UėÓ !QY?S `² )Ç -ØCV_= Ĝ ʤ . ģ .da ğĊ࿲4ED^:0Ü- !ĖĤ Ãåé!ėN_U0M[ >ĄM[>ĄėN_U|ąQY?S0 ÞģSiO2 4ED^:Q]@> ÷² å éĤ ðÈģÆ DC v® Ĝ× `²)Ç -ØCV_= 0#ā Ð ģ(ģ SiO2 4 E D ^ : \ _ H ! 460nm/min ù¡L31>ÞĎėÖ Ę¤ ğ Ċ ࿲4ED^: Ü Ĥb¬ģM[> ĄėN_U|ąQY?S0Þ- Ę¥ę òôfľ -ğĊ࿲4ED^: Ü Â« -Ĥ. 2.3.3 ÿõ ̵ ¶!ģÃåé pĝ
(28) ģEBEP 0ÞëîY =6[Ö) DLC Q]@>" ±Þ0åé,ģ µÈ0 Q]@>" ČÞ ö Ĥ ÃåéÞ-ÿõ ̵0 2.3.3 çĤ$ ģQY?S6A_Iě ģLaB6 G2>9 B^:>F^O2YV^H+ -REH6A_I +ė ¼t.ģ Ar 7>0q- DC Ar QY?S0áÝ-ĤDC QY?S ¼ė ėÓ!ėėÓ ID *v®.-Ĥ DC QY ?S+ė % § ¸.ģ{Ċě { Ċ.-Ĥ {Ċ4J[8_!ãÓė VA. 36. *v®.-ĤM[>Ą EBEP ! ãÓėÖ0Ò½ 50kHzģGX_F2Í 50Ġ M[>Ą-Ĥėæä A B *,TY_æ0 áÝģė0ÁïėË ĒĎ ģ{ Ċ.ėN_U! EBEP ě q.-ĤEBEP ě ! Ar 7> C4F8 7> Õ7> Q]@>7 > iñ.,ģ{Ċ.ėN_U ýê *,āĕ.ģğ¦ QY?S0áÝ-Ĥ āĕ Þ+. ėN_U!ØĐ~ø ġSiO2Ģ c Si Ç ã»ýê-ĤSiO2 c. Si Ç!ģo äúDX_P *,QY?S+ė Îâ òô.㪠20mm rí¨ >F^\>² R[C_a Ăõ.ģÁïėË+ 210mm Ćĕ ďõ.-Ĥ Ç0ďõ->F^\>²R[C_!sÏ *,Ïs.,ģėÎâ Ô}Ú³ -ĤQY ?Sģ6A_Iě ėÓ0v®- *ģ t -ė đ0v® ģº
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(59) ( ) j Z ; 2008 h 3 y B q R ¡ p163-168 qi. 5.3 QÂ;´SN [1] C. Itoh and S. Fukuda, FT-IR study of photo-induced phase transition in organic charge-transfer crystal of TTF-CA”, 7th Int. Conf. on Excitonic Processes in Condensed Mater (EXCON’06), Winston-Salem, NC, USA (2006). [2] T. Ohta, M. Ito, K. Takeda, and M. Hori, Micro machining process for optical device using compact electron-beam-excited plasma”, 6th International Conference on Reactive Plasmas and 23rd symposium on plasma processing, P2A-33, pp.457, Japan,(2006). [3] M. Ito(invited), K. Takeda, T. Ohta and M. Hori, Micro-nano fabrication employing electron-beam-excited plasma and their diagnostics, The 3rd International Workshop on Advanced Plasma Processing and Diagnostics, Korea, (2006) [4] C. Itoh, K. Uotome, K. Kisoda, T. Murakami, and H. Harima, Structural change of single-walled carbon nanotube induced by soft X-ray irradiation”, The 14th International conference on Radiation Effects in Insulators (REI1007) Caen, France (2007). [5] K. Kisoda, T. Murakami, K. Matsumoto, R. Naito, H. Kakehi, and H. Harima, "Raman spectroscopy of Isolated Double Walled Carbon Nanotubes", 22nd International Winterschool on Electronic Properties of Novel Materials, Kirchberg in Tirol, Oesterreich (2008).. 5.4 QAZ;SN [1] ÇF5Ê:I_Ê|xµ 1&0!" +1$ @²¶¹UGÊ ËÍ P@k;ÊWÀÈ2006É. [2] ~LÊ:I_ Bk}z'-v .0 @²¶ ¸Ê 16 P@k;ÊWÀeWÈ2006É. [3] ¼Ê¬~O4Ê:I_ “ĪE½< TTF-CA ¤w @]3 FT-IR ±\”Ê t~Z;Ê(2006). [4] ~LÊ`¾89Ê:I_ Bk}r '- .0J¤w
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