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液相合成法によるダイヤモンド様炭素膜の作製

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኱ྠ኱Ꮫ⣖せ ➨ 51 ᕳ㸦2015㸧

ᾮ┦ྜᡂἲ࡟ࡼࡿࢲ࢖ࣖࣔࣥࢻᵝⅣ⣲⭷ࡢస〇

Deposition of diamond-like carbon film by chemical solution process

ᶫᮏ 㞝୍*

Yuichi Hashimoto

Summary

Diamond-like carbon (DLC) films were deposited by the chemical solution process using negative bias on three substrates (cobalt, silicon, Indium Tin Oxide (ITO)). In the cobalt and ITO substrates, a solution of methanol at 60 degrees was employed as the electrolyte. In the silicon substrate, the electrolyte consisted of methanol and methanol-ammonia solutions at 60 degrees. From the results of Raman spectra and X-ray photoelectron spectroscopy, it was confirmed that: (I) the film on cobalt substrate was amorphous containing small amounts of diamond component, (II) the film on silicon substrate was composed of DLC structure and nitrogen atoms were doped in the film, (III) the Raman spectrum of film on ITO substrate showed lines at 1130 cm-1, 1300 cm-1, 1460 cm-1, inherent those of polyacetylene compornent .

࣮࣮࢟࣡ࢻ㸸ᾮ┦ྜᡂ㸪Ⅳ⣲㸪ࢲ࢖ࣖࣔࣥࢻࣛ࢖ࢡ࣮࢝࣎ࣥ㸪࣓ࢱࣀ࣮ࣝ Keywords㸸solution growth, carbon, diamond-like carbon, methanol

㸬ࡣࡌࡵ࡟ ㏆ᖺࠊࢲ࢖ࣖࣔࣥࢻ࡜ࢢࣛࣇ࢓࢖ࢺࡢ㦵᱁ᵓ㐀ࢆ᭷ ࡍ ࡿ ࢲ ࢖ ࣖ ࣔ ࣥ ࢻ ᵝ Ⅳ ⣲ ⭷ 㸦 DLC 㸸 Diamond-Like Carbon㸧⭷ࡣࠊ㧗◳ᗘ࣭పᦶ᧿ಀᩘ࣭㧗⪏ᦶ⪖ᛶ࣭㧗⏕ యぶ࿴ᛶ࣭㧗࢞ࢫࣂࣜ࢔ᛶ࡞࡝ࡢᛶ㉁ࢆᣢࡘࡓࡵࠊᕤ ලࡸ PET ࣎ࢺࣝࡢෆቨ⭷ࠊ⮬ື㌴㒊ရࡢ࡯࠿ࠊࢩࣜࢥ ࣥ࡟᭰ࡿ᪂ࡋ࠸༙ᑟయ⏝ᇶᯈࡸ㟁Ꮚᨺฟᮦᩱ࡜ࡋ࡚ὀ ┠ࡉࢀ࡚࠸ࡿ1) ᚑ᮶ࠊDLC ⭷ࡢస〇࡟ࡣࠊ୺࡟Ẽ┦ἲࡀ⏝࠸ࡽࢀ࡚ ࠾ࡾࠊ౛࠼ࡤ⇕ࣇ࢕࣓ࣛࣥࢺ໬ᏛẼ┦⵨╔㸦CVD㸧ἲࠊ 㧗࿘Ἴࣉࣛࢬ࣐ CVD ἲࠊ࣐࢖ࢡࣟἼࣉࣛࢬ࣐ CVD ἲ ࡞࡝ࡢపᅽẼ┦ἲࡀ┒ࢇ࡟◊✲ࡉࢀ࡚࠸ࡿ2㹼5)ࠋࡇࢀࡽ ࡢ〇⭷ἲ࡛ࡣࠊ┿✵⿦⨨ࡸ㧗࿘Ἴ㟁※ࠊཎᩱ࡜ࡋ࡚㧗 ⣧ᗘࡢ࣓ࢱࣥ➼ࡢ㧗ᅽ࢞ࢫࢆ⏝࠸ࡿࡓࡵ㧗㢠࡞タഛࡀ ᚲせ࡛࠶ࡿࠋࡲࡓ┿✵࡟せࡍࡿ᫬㛫ࡸᡭ㛫ࠊ⭷ࢆᡂ㛗 ࡉࡏࡿᇶᯈ ᗘ㸦ᩘⓒΥ㸧ࡢไᚚ࡞࡝ࣉࣟࢭࢫࡀ」㞧 ࡛࠶ࡿ࡜ඹ࡟㧗ࢥࢫࢺ࡛࠶ࡿࠋ ᮏ◊✲࡛ࡣࠊࡇࢀࡲ࡛Ṥ࡝᳨ウࡀ࡞ࡉࢀ࡚࠸࡞࠸᪂ ࡓ࡞ DLC 〇⭷ἲࡢヨࡳ࡜ࡋ࡚ࠊᾮ┦ྜᡂἲ㸦㟁Ẽศゎ ἲ㸧6㹼8)࡟ࡼࡾࠊ࣓ࢱࣀ࣮ࣝ㸦MeOH㸧ࠊ࣓ࢱࣀ࣮ࣝ⁐ᾮ ୰࡟࢔ࣥࣔࢽ࢔㸦NH3㸧ࢆῧຍࡋࡓ⁐፹㸦MeOH- NH3㸧 ࢆ⏝࠸࡚ DLC ⭷ࡢస〇ᐇ㦂ࢆ⾜ࡗࡓࠋ࢔ࣥࣔࢽ࢔ࢆῧ ຍࡍࡿ┠ⓗࡣࠊ⁐፹ࡢᑟ㟁⋡ࢆྥୖࡉࡏ࡚〇⭷࡟࠾ࡅ ࡿ༳ຍ㟁ᅽࡢపῶཬࡧ⭷࡬ࡢ❅⣲ࢻ࣮ࣆࣥࢢࢆ⾜࠺ࡓ ࡵ࡛࠶ࡿࠋᮏ◊✲ࡣࠊᚓࡽࢀࡓⷧ⭷ࡢ⭷≀ᛶ࡜ᵓ㐀ศ ᯒࢆホ౯ࡋࡓ⤖ᯝ࡟ࡘ࠸࡚ሗ࿌ࡍࡿࡶࡢ࡛࠶ࡿࠋ 㸬ᐇ㦂᪉ἲ ᅗ 1 ࡟ DLC స〇ࡢࡓࡵࡢ⿦⨨ᅗࢆ♧ࡍࠋᐇ㦂࡟⏝࠸ ࡓ⁐፹ࡣࠊձMeOH ⁐ᾮࠊղ࢔ࣥࣔࢽ࢔࢞ࢫࢆ 3 ࣜࢵ 㸨 ኱ྠ኱Ꮫ ᕤᏛ㒊 㟁Ẽ㟁ᏊᕤᏛ⛉

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ࢺࣝ/ศࡢὶ㔞࡛ 3 ศ㛫ࣂࣈࣜࣥࢢࡋࡓ MeOH ⁐ᾮ 㸦MeOH-NH3㸧ࡢ 2 ✀㢮࡛࠶ࡿࠋࡲࡓࠊ㝧ᴟ࡜ࡋ࡚Ⅳ⣲ ᯈࢆࠊ㝜ᴟࡣ Co㸦ࢥࣂࣝࢺ㸧ᇶᯈࠊSi㸦ࢩࣜࢥࣥ㸧ᇶ ᯈࠊITO㸦Indium Tin Oxide㸧ᇶᯈࡢ 3 ✀㢮ࢆ⏝ពࡋࡓࠋ

Co ᇶᯈࡣࠊ⾲㠃ࢆࣂࣇ◊☻ࡋࡓᚋࠊ10㸣Ỉ㓟໬ࢼࢺ ࣒ࣜ࢘⁐ᾮ୰࡛Ὑίࡋࡓࡶࡢࢆ⏝࠸ࡓࠋSi ᇶᯈࡣࠊ5㸣 ࣇࢵ㓟Ỉ⁐ᾮ୰࡟ 10 ศ㛫ᾐₕࡋࠊ㓟໬⭷ࢆ㝖ཤࡋࡓࡶ ࡢࢆ⏝࠸ࡓࠋITO ᇶᯈࡣࠊ࢚ࢱࣀ࣮ࣝ⁐ᾮ୰࡛ 30 ศ㛫 ㉸㡢ἼὙίࡋࠊ࢛࣮࢘ࢱ࣮࣐࣮ࢡࡀṧࡽ࡞࠸ࡼ࠺ࠊࢻ ࣛ࢖࣮࡛ࣖ஝⇱ࡉࡏࡓࠋ ࡑࡢᚋࠊୖグྛ㟁ᴟࢆ⁐፹୰࡟㟁ᴟ㛫㊥㞳 2mm ࡛ᅛ ᐃࡋࠊ⁐፹ ᗘ 60Υࠊ㟁ὶᐦᗘ 0.29㹼4 mA/cm2ࠊ〇⭷ ᫬㛫 8 ᫬㛫࡛ྛᇶᯈୖ࡟ⷧ⭷ࢆሁ✚ࡉࡏࡓࠋ ᚓࡽࢀࡓⷧ⭷ࡢ⭷≀ᛶ㸦௙஦㛵ᩘ㸧ࡣ᥋ゐ㟁㐪ἲ 㸦FAC-1㸪⌮◊ィჾ㸧ࢆ⏝࠸࡚ ᐃࡋࠊ⾲㠃ᙧ≧ࡣཎᏊ 㛫ຊ㢧ᚤ㙾㸦AFM㸹SPI-3800㸪SII ࢼࣀࢸࢡࣀࣟࢪ࣮㸧 ࡟ࡼࡾほᐹࡋࡓࠋࡲࡓࠊ⭷ࡢᵓ㐀ศᯒࢆ࣐ࣛࣥศගἲ 㸦NRS-1000㸪᪥ᮏศග㸧࡜ XPS㸦ESCA 5400MC㸪Physical Electronics㸧࡟ࡼࡾホ౯ࡋࡓࠋ

Fig.1. Schematic diagram of deposition system

㸬ᐇ㦂⤖ᯝ࠾ࡼࡧ⪃ᐹ  &R ᇶᯈୖ࡬ࡢ '/& ⷧ⭷స〇 ᅗ 2 ࡣࠊMeOH ⁐፹୰࡛ Co ᇶᯈୖ࡟㟁ὶᐦᗘ 4 mA/cm2ࠊ⁐፹ ᗘ 60Υ࡛ 8 ᫬㛫〇⭷ࡋࡓⷧ⭷ࡢ࣐ࣛࣥ ࢫ࣌ࢡࢺ࡛ࣝ࠶ࡿࠋ⺯ගᡂศ࡟క࠺ಙྕࡀከࡃྵࡲࢀ ࡿࡀࠊ1600 cm-1㏆ഐ࡟㠀ᬗ㉁Ⅳ⣲࡟⏤᮶ࡍࡿࣈ࣮ࣟࢻ ࡞ࣆ࣮ࢡ࡜ 1400 cm-1㏆ഐ࡟ࢲ࢖ࣖࣔࣥࢻᵓ㐀࡟⏤᮶ࡍ ࡿࣈ࣮ࣟࢻ࡞ࣆ࣮ࢡࡀほ ࡉࢀࡓࠋᚓࡽࢀࡓࢫ࣌ࢡࢺ ࣝࡣࠊNovikov ➼8)ࡀ Co ᇶᯈୖ࡟ᾮయ࢔ࣥࣔࢽ࢔࡜࢔ ࢭࢳࣞࣥ࢞ࢫࢆ⏝࠸࡚స〇ࡋࡓ⭷ࢆホ౯ࡋࡓ࣐ࣛࣥࢫ ࣌ࢡࢺࣝ࡟㠀ᖖ࡟㢮ఝࡋ࡚࠾ࡾࠊMeOH ⁐፹ࢆ⏝࠸ࡓ స〇ἲ࡟࠾࠸࡚ࡶ DLC ⭷ࡢస〇ࡀྍ⬟࡛࠶ࡿࡇ࡜ࢆ♧ ၀ࡋ࡚࠸ࡿࠋ

Fig.2. Raman spectrum of film on Co substrate

 6L ᇶᯈୖ࡬ࡢ '/& ⷧ⭷స〇 ᅗ 3 ࡣࠊMeOH ⁐ᾮཬࡧ MeOH-NH3⁐፹࡛Ⅳ⣲ᯈ ࡜ n-Si ᇶᯈ㛫࡟ 4 mA/cm2ࡢᐃ㟁ὶࢆὶࡋࠊⷧ⭷ࢆస 〇ࡋࡓ㝿ࡢ᫬㛫㸫㟁ᅽ≉ᛶ࡛࠶ࡿࠋNH3ࢆῧຍࡋࡓሙ ྜࠊMeOH ⁐ᾮ༢⊂࡟ẚ࡭࡚ࠊ୍ᐃ㟁ὶࢆὶࡍሙྜ ࡟ᚲせ࡞༳ຍ㟁ᅽ್ࡣࠊ〇⭷㛤ጞ┤ᚋ࡛⣙ 200 Vࠊ8 ᫬㛫ᚋ࡛ 800 V పୗࡋࡓࠋNH3ࡣࠊMeOH ⁐ᾮ୰࡛ NH4+ࡸ NH2-➼ࡢ࢖࢜ࣥ࡟࡞ࡾࡸࡍ࠸ࡓࡵࠊ⁐፹ࡢᑟ 㟁ᛶࡀྥୖࡍࡿࡶࡢ࡜⪃࠼ࡽࢀࡿࠋ MeOH ⁐፹୰࡛〇⭷ࡋࡓⷧ⭷ࡢ⭷ཌ࡜య✚᢬ᢠ⋡ ࡣࠊࡑࢀࡒࢀ⣙ 2ȝm ࡜⣙ 1014 ȍcm ࡛࠶ࡗࡓࠋ୍᪉ࠊ MeOH- NH3⁐፹୰࡛స〇ࡋࡓⷧ⭷ࡢ⭷ཌ࡜᢬ᢠ⋡ࡣࠊ ࡑࢀࡒࢀ⣙ 800nmࠊ⣙ 108 ȍcm ࡜␗࡞ࡗࡓ್ࢆ♧ࡋ ࡓࠋ

Fig.3. Voltage-time characteristic of films deposited for 8 h at 4 mA/cm2 in (a) methanol and (b) methanol-ammonia solutions

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Table 1. Work function values of DLC films Work function [eV] Solution MeOH MeOH-NH3

DLC film 5.02 4.68 ⾲ 1 ࡣࠊ〇⭷ᚋࡢⷧ⭷ࡢ௙஦㛵ᩘ್ࡢ⤖ᯝ࡛࠶ࡿࠋ MeOH-NH3⁐፹୰࡛స〇ࡋࡓⷧ⭷ࡢ௙஦㛵ᩘ್ࡣࠊ MeOH ⁐፹୰࡛స〇ࡋࡓ⭷࡟ẚ࡭࡚ࠊ⣙ 0.4eV పୗࡋ ࡓࠋ୍⯡࡟ࠊ❅⣲ཎᏊࡀΰධࡋ࡚࠸ࡿ⭷ࡣ n ᆺ༙ᑟ య≉ᛶࢆ♧ࡍ࡜࠸࠺ሗ࿌4, 5)ࡀ࠶ࡿࡇ࡜࠿ࡽࠊ᢬ᢠ್ ཬࡧ௙஦㛵ᩘ್ࡀపୗࡋࡓཎᅉ࡜ࡋ࡚ࠊ❅⣲ཎᏊࡀ ⷧ⭷୰࡟ΰධࡋ࡚࠸ࡿࡶࡢ࡜᥎ ࡉࢀࡿࠋ ᅗ 4 ࡣࠊ␗࡞ࡿ⁐፹୰࡛స〇ࡋࡓⷧ⭷ࡢ AFM ീ࡛ ࠶ࡿࠋMeOH ⁐፹୰࡛స〇ࡋࡓⷧ⭷ࡢᖹᆒ㠃⢒ࡉ 㸦Rz㸧ࡣ⣙ 780 nm ࡛ࠊ᭱኱⣙ 1ȝm ࡢพฝࡀㄆࡵࡽ ࢀࡓ㸦ᅗ 4(a)㸧ࠋ୍᪉ࠊMeOH-NH3⁐፹୰࡛స〇ࡋࡓ ⷧ⭷ࡢᖹᆒ㠃⢒ࡉ㸦Rz㸧ࡣ⣙ 300 nm ࡛࠶ࡾࠊMeOH ⁐፹ࡢ⭷࡟ẚ࡭࡚พฝࡣᑠࡉࡃ࡞ࡗࡓ㸦ᅗ 4(b)㸧ࠋNH3 ࢆῧຍࡋࡓ⣔࡛ࡣࠊᅗ 3 ࡢࡼ࠺࡟ᮍῧຍࡢሙྜ࡟ẚ ࡭࡚ࠊ⁐፹ࡢᑟ㟁ᛶࡀ⣙ 3㹼5 ಸྥୖࡍࡿࡓࡵࠊ⭷ᡂ 㛗᫬࡟࠾ࡅࡿᇶᯈ࡬ࡢ㟁⏺ᙉᗘࡀᑠࡉࡃ࡞ࡿࡇ࡜ࡀ ண᝿ࡉࢀࡿࠋᚑࡗ࡚ࠊୖグࡢ⭷ᙧ≧ࡢ㐪࠸ࡣࠊSi ᇶ ᯈ⾲㠃ୖ࡛ᡂ㛗ࡍࡿⅣ⣲໬ྜ≀ࡢ㐠ື࢚ࢿࣝࢠ࣮ࡢ ኱ࡁࡉࡀ⭷ᡂ㛗࡟ᙳ㡪ࢆཬࡰࡋ࡚࠸ࡿࡇ࡜ࡀ୍ᅉ࡛ ࠶ࡿ࡜⪃࠼ࡽࢀࡿࠋ

(a) Methanol solution

(b) Methanol-ammonia solution

Fig.4. AFM images of films deposited in (a) methanol and (b) methanol-ammonia solutions

ᅗ 5 ࡟ࠊ␗࡞ࡿ⁐፹୰࡛స〇ࡋࡓⷧ⭷ࡢ࣐ࣛࣥࢫ ࣌ࢡࢺࣝࢆ♧ࡍࠋ2 ࡘࡢⷧ⭷ඹ࡟ࠊ1400 cm-1㏆ഐ࡟ࢲ ࢖ࣖࣔࣥࢻᵓ㐀࡟㉳ᅉࡍࡿ D ࣆ࣮ࢡࠊ1580 cm-1㏆ഐ ࡟㠀ᬗ㉁Ⅳ⣲ᵓ㐀࡟㉳ᅉࡍࡿࣈ࣮ࣟࢻ࡞ A ࣆ࣮ࢡࠊ 1600 cm-1㏆ഐ࡟⤖ᬗᛶࡢ㧗࠸ࢢࣛࣇ࢓࢖ࢺᵓ㐀࡟㉳ ᅉࡍࡿࢩ࣮ࣕࣉ࡞ G ࣆ࣮ࢡࡀほ ࡉࢀࡓ4, 7, 9, 10)ࠋࡇ ࢀࡽࡢࣆ࣮ࢡࡢⓎ⌧ࡣࠊMeOH ཬࡧ MeOH-NH3⁐፹ ୰࡛స〇ࡋࡓⷧ⭷ࡀ DLC ᵓ㐀ࢆ᭷ࡋࡓ⭷࡛࠶ࡿࡇ࡜ ࢆ♧၀ࡋ࡚࠸ࡿࠋḟ࡟ 3 ࡘࡢࣆ࣮ࢡࢆศ㞳ࡋࠊྛࣆ ࣮ࢡࡢ㠃✚ẚࢆゎᯒࡋࡓ⤖ᯝࠊMeOH ⁐፹࡛ࡣࢲ࢖ ࣖࣔࣥࢻᵓ㐀࡜㠀ᬗ㉁Ⅳ⣲ᵓ㐀ࡀ⣙ 1㸸1 ࡢ⭷ࡀࠊ MeOH-NH3⁐፹࡛ࡣṤ࡝ࡀ㠀ᬗ㉁Ⅳ⣲ᵓ㐀࡛ᙧᡂࡉ ࢀ࡚࠸ࡿ⭷࡛࠶ࡿࡇ࡜ࡀ᫂ࡽ࠿࡜࡞ࡗࡓࠋ ⾲ 2 ࡣࠊࡇࢀࡽࡢⷧ⭷ࡢ XPS ඖ⣲ศᯒࡢ⤖ᯝ࡛࠶ ࡿࠋMeOH-NH3⁐፹୰࡛స〇ࡋࡓⷧ⭷ࡣࠊMeOH ⁐ ፹ࡢⷧ⭷࡟ẚ࡭࡚ࠊ❅⣲ࡢྵ᭷㔞ࡀ⣙ 5 ಸቑຍࡋ࡚ ࠾ࡾࠊ๓㏙ࡋࡓయ✚᢬ᢠ⋡ཬࡧ௙஦㛵ᩘ್ࡢపୗࢆ ⿬௜ࡅࡿ⤖ᯝ࡜࡞ࡗࡓࠋ            

(a) Methanol solution            (b) Methanol-ammonia solution 

Fig.5. Raman spectra of films deposited for 8 h at 4 mA/cm2 in (a) methanol and (b) methanol-ammonia solutions

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Table 2. Atomic concentrations of films deposited for 8 h at 4 mA/cm2 in (a) methanol and (b) methanol-ammonia solutions

elements solutions C N O others atom% MeOH 27 2 55 16 MeOH-NH3 34 11 40 15  ,72 ᇶᯈୖ࡬ࡢ '/& ⷧ⭷స〇 ᐇ㦂࡟ࡣࠊ࢞ࣛࢫᇶᯈୖ࡟ࢫࣃࢵࢱἲ࡟ࡼࡾ⭷ཌ⣙ 100 nm ࡢ ITO ⭷ࢆタࡅࡓᇶᯈࢆ⏝࠸ࡓࠋࡲࡓࠊᾮ┦ྜ ᡂ୰ࡢ⭷ᙧᡂ࡟ཬࡰࡍᇶᯈ⾲㠃ࡢᙳ㡪ࢆㄪ࡭ࡿࡓࡵ࡟ࠊ ITO ⭷࡟-50 V ࡢ㟁ᅽࢆ༳ຍࡋ࡞ࡀࡽࠊ࢜ࢰࢼ࢖ࢨ࣮࡛ 1 ศ㛫࢜ࢰࣥฎ⌮ࢆ᪋ࡋࡓᇶᯈࡶేࡏ࡚⏝ពࡋࡓࠋᅗ 6 ࡣࠊ60Υࡢ MeOH ⁐፹୰࡟࠾࠸࡚ࠊᐃ㟁ὶ 0.29 mA/cm2 〇⭷᫬㛫 60 ศࡢ᮲௳ୗ࡛ ITO ᇶᯈୖ࡟స〇ࡋࡓⷧ⭷ࡢ ࣐ࣛࣥࢫ࣌ࢡࢺ࡛ࣝ࠶ࡿࠋ〇⭷୰ࠊ༳ຍ㟁ᅽ್ࡣࠊ⣙ 100 V ࡢ୍ᐃ್ࢆ♧ࡋࠊ㟁ᅽࡢ᫬㛫ኚືࡣㄆࡵࡽࢀ࡞࠿ ࡗࡓࠋ ᅗ 6 ࡼࡾࠊᮍฎ⌮ ITO ࡛ࡣࠊ1130 cm-1㸪1180 cm-1 1220 cm-1㸪1300 cm-1㸪1330 cm-1㸪1460 cm-1㸪1580 cm-1 ࡞࡝ከᩘࡢࣆ࣮ࢡࡀほ ࡉࢀࡓࠋ1130 cm-1㸪1300 cm-1 1460 cm-1ࡢࣆ࣮ࢡࡣࠊ࣏ࣜ࢔ࢭࢳࣞࣥ㸦PA㸧⏤᮶ࡢࣆ ࣮ࢡ11)࡟㢮ఝࡋ࡚࠾ࡾࠊPA ࡜ DLC㸦1330 cm-1㸪1580 cm-1 ࡀΰᅾࡍࡿ⭷࡛࠶ࡿࡶࡢ࡜᥎ ࡉࢀࡿࠋ୍᪉ࠊ࢜ࢰࣥ 㸦O3㸧ฎ⌮ ITO ࡣࠊ1400 cm-1㏆ഐ࡟ࢲ࢖ࣖࣔࣥࢻᵓ㐀 ࡟⏤᮶ࡍࡿࣈ࣮ࣟࢻ࡞ࣆ࣮ࢡ࡜ 1580 cm-1㏆ഐ࡟㠀ᬗ㉁ Ⅳ⣲࡟⏤᮶ࡍࡿࣈ࣮ࣟࢻ࡞ࣆ࣮ࢡࡀほ ࡉࢀࠊ඾ᆺⓗ ࡞ DLC ᵓ㐀ࢆ᭷ࡋࡓ⭷࡛࠶ࡿ࡜⪃࠼ࡽࢀࡿࠋ

Fig.6. Raman spectra of films deposited on ITO substrates for 1 h at 0.29 mA/cm2 in methanol

୍⯡࡟ࠊITO ⾲㠃࡟ᑐࡋ࡚㓟⣲ࣉࣛࢬ࣐ࡸ UV ࢜ࢰࣥ ࢆ⏝࠸࡚ฎ⌮ࢆ᪋ࡋࡓሙྜࠊ㓟⣲࢖࢜ࣥࡸ࢜ࢰࣥ࡟ࡼ ࡾ ITO ⾲㠃㏆ഐࡢⅣ໬Ỉ⣲⣔ṧ␃≀㉁ࡀ㝖ཤࡉࢀࠊΎ ί࡞⾲㠃ࡀᚓࡽࢀࡿࠋࡲࡓྠ᫬࡟ࠊITO ⾲㠃ࡢ㓟⣲ཎᏊ ࡸỈ㓟ᇶࡢ㓄఩≧ែࡀኚ໬ࡋ 12, 13)ࠊITO ⾲㠃ୖ࡟ᙧᡂ ࡉࢀࡿ⭷ᵓ㐀㸦⤖ᬗᛶ㸧࡟ᙳ㡪ࢆཬࡰࡍሗ࿌ࡀ࠶ࡿ14, 15) ࡋࡓࡀࡗ࡚ࠊ࢜ࢰࣥฎ⌮ࡢ᭷↓࡟ࡼࡾస〇ࡋࡓ⭷ࡢᵓ 㐀ࡀኚ໬ࡋࡓ⌧㇟ࡣࠊITO ⾲㠃ࡢ㟁Ꮚ≧ែࡢኚ໬ࡀࠊࡑ ࡢᚋࡢᾮ┦ྜᡂ୰࡟࠾ࡅࡿ⭷ᙧᡂ࡟ᙳ㡪ࢆཬࡰࡋ࡚࠸ ࡿࡶࡢ࡜⪃࠼ࡽࢀࡿࡀࠊヲ⣽ࡣ୙࡛᫂࠶ࡿࠋ 㸬ࡲ࡜ࡵ ᮏ◊✲ࡢ㟁Ẽศゎἲࢆ⏝࠸࡚స〇ࡋࡓ⭷ࡣࠊ࣐ࣛࣥ ศගἲ➼ࡢ ᐃ⤖ᯝࡼࡾࠊࢲ࢖ࣖࣔࣥࢻࣛ࢖ࢡ࣮࢝࣎ ࣥ≉᭷ࡢᵓ㐀ࢆ᭷ࡋࠊ⭷ෆ࡬❅⣲➼ࡢῧຍ≀ࢆᐜ᫆࡟ ࢻ࣮ࣉࡍࡿࡇ࡜ࡀྍ⬟࡛࠶ࡿࡇ࡜ࡀ᫂ࡽ࠿࡜࡞ࡗࡓࠋ ࡲࡓࠊᇶᯈᮦᩱࡢ✀㢮ࡸ⾲㠃≧ែࢆኚ࠼ࡿࡇ࡜࡟ࡼ ࡾࠊ௦⾲ⓗ࡞ᑟ㟁ᛶ࣏࣐࣮ࣜࡢ୍ࡘ࡛࠶ࡿ࣏ࣜ࢔ࢭࢳ ࣞࣥᵓ㐀ࢆྵࡴ⭷ࡢᙧᡂࡀ♧၀ࡉࢀࡓࠋ ࡇࡢࡼ࠺࡟ࠊ᭷ᶵ⁐፹ࢆ⏝࠸ࡓᾮ┦ྜᡂἲࡣࠊᵝࠎ ࡞ᛶ㉁ࢆ᭷ࡍࡿ '/& ⭷ࢆ๰〇ࡍࡿࡓࡵࡢ᭷⏝࡞ᡭἲ࡛ ࠶ࡿࡶࡢ࡜⪃࠼ࡽࢀࡿࠋ ཧ⪃ᩥ⊩

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Table 1. Work function values of DLC films  Work function [eV]
Table 2. Atomic concentrations of  films  deposited for 8  h at 4 mA/cm 2  in (a) methanol and (b) methanol-ammonia  solutions

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