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Complete parameterization of the dielectric function of microcrystalline silicon fabricated by plasma-enhanced chemical vapor deposition

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Title Complete parameterization of the dielectric function ofmicrocrystalline silicon fabricated by plasma-enhanced chemical vapor deposition( 本文(Fulltext) )

Author(s) YUGUCHI, Tetsuya; KANIE, Yosuke; MATSUKI, Nobuyuki;FUJIWARA, Hiroyuki

Citation [Journal of Applied Physics] vol.[111] no.[8] p.[083509]

Issue Date 2012-04-15

Rights Copyright (2012) American Institute of Physics. This article maybe downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. Version 出版社版 (publisher version) postprint

URL http://hdl.handle.net/20.500.12099/44568

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