213 0012 3 2 1 KSP C-1232 TEL 044 850 9759
FAX 044 819 2205
E-mail: k-kajihara net.ksp.or.jp
Silica glass for deep-ultraviolet and vacuum-ultraviolet
optical materials
Koichi Kajihara㈙, Yoshiaki Ikuta, Masahiro Hirano
Transparent Electro-Active Materials Project, ERATO, JSTMasanori Oto
Showa Electric Wire and Cable Co. Ltd.Hideo Hosono
Materials and Structures Laboratory, Tokyo Institute of Technology.
300
200 nm
200 nm
KrF(5.0 eV, 248
nm), ArF(6.4 eV, 193 nm
Fig. 1
KrF, ArF
F
27.9 eV, 157 nm
7.9
eV
F
2 1)mm
cm
cm
15 mm Dry; SiOH 1 1016
cm 3, Wet; SiOH 2 1019cm 3, F-doped;
SiOH 1 1016cm 3, SiF 2 1020 cm 3 F 2 F2 8 mJ cm 2pulse 1 3.6 105
.
SiOH
10
19cm
3Wet
KrF, ArF
SiOH
7.4 eV
2)Wet
F
2Fig. 2
SiOH
Dry
Si-Si
Si-Si
7.6 eV
3)F
2SiOH
Si-Si
F
2Fig. 2
SiF
4) 6)Si-F
Si-O
SiF
SiOH
Si-Si
F
2Modi-ˆed Silica
F
2SiOH
Si-Si
Si-O-Si
SiO
43
(SiO)
34
(SiO)
4Si-O-Si
7),8)3
4
Raman
D
2, D
1 8),9)3
4
Si-O-Si
a
10)Raman SiOH 2 1018cm 3 F2 NBOHC F2 30 mJ cm 2pulse 1
Si-O-Si
SiF
.
NBOHC
NBOHC
H
2NBOHC
H
2NBOHC
H
2H
0 14)NBOHC
E center( Si )
4 7 eV
KrF, ArF
F
2Si-Si
H
2(a)ArF b)F2 ArF 30 mJ cm 2pulse 1 1 107 F 2 6.7 mJ cm 2 pulse 1 2.88 106 H2 1 1018cm 3 ( ) 1 m ArF ArF 50 mJ cm 2pulse 1 ArF )
Fig. 5)
15).
DNA
193 nm
6.4 eV
ArF
1 m
60
Fig. 6)
16)5.8 eV
E center
E center
H
2ArF
10
DUV-SNOM
.
F
J. Vac. Sci. Technol. B 15, 2112 (1997). 2) Y. Morimoto, S. Nozawa and H. Hosono, Phys.
Rev. B 59, 4066 (1999).
3) L. Skuja, H. Hosono and M. Hirano, Proc. SPIE 4347, 155 (2001).
4) 69, 415 (2000).
5) M. Mizuguchi, L. Skuja, H. Hosono and T. Oga-wa, Opt. Lett. 24, 863 (1999).
6) M. Mizuguchi, L. Skuja, H. Hosono and T. Oga-wa, J. Vac. Sci. Technol. B 17, 3280 (1999). 7) J. C. Mikkelsen, Jr. and F. L. Galeener, J.
Non-12) L. Skuja, J. Non-Cryst. Solids 239, 16 (1998). 13) K. Kajihara, L. Skuja, M. Hirano and H. Hosono,
Appl. Phys. Lett. 79, 1757 (2001).
14) K. Kajihara, L. Skuja, M. Hirano and H. Hosono, Phys. Rev. Lett. 89, 135507 (2002).
15) Y. Ikuta, K. Kajihara, M. Hirano, S. Kikugawa and H. Hosono, Appl. Phys. Lett. 80, 3916 (2002).
16) M. Oto, S. Kikugawa, N. Sarukura, M. Hirano and H. Hosono, IEEE Photo. Technol. Lett. 13, 978 (2001).